ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,307, issued on Dec. 30, was assigned to Lam Research Corp. (Fremont, Calif.).
"Profile twisting control in dielectric etch" was invented by Neil Macaraeg Mackie (Fremont, Calif.), Kevin Lai (San Jose, Calif.), Chen Li (San Jose, Calif.) and He Zhang (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a vacuum chamber with upper and lower electrodes and a processing zone for processing a substrate using plasma. The upper electrode includes a surface that is substantially parallel to a surface of the substrate when the substrate is positioned in the chamber. The apparatus includes at least one magn...