ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,404,585, issued on Sept. 2, was assigned to L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude (Paris).
"Lithium precursors for deposition of lithium-containing layers, islets or clusters" was invented by Christian Dussarrat (Yokosuka, Japan), Keishi Yamamoto (Yokosuka, Japan), Nicolas Blasco (Paris) and Sunao Kamimura (Tsukuba, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for forming a Li-containing film, islet or cluster on a substrate comprise the steps of introducing a vapor of a silicon-free lithium precursor into a reactor and depositing at least part of the silicon-free lithium precursor onto ...