ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,398,275, issued on Aug. 26, was assigned to L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude (Paris).
"Group V element-containing film compositions and vapor deposition of Group V element-containing film" was invented by Wontae Noh (Seoul, South Korea) and Jooho Lee (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for forming a Group V-containing film comprise: a) exposing a substrate to a vapor of a Group V-containing film forming composition; b) exposing the substrate to a co-reactant; and c) repeating the steps of a) and b) until a desired thickness of the Group V-containing film is de...