US Patent Issued to Korean Research Institute of Standard and Science on June 10 for "Vibration insensitive interferometry for measuring thickness and profile of multilayer thin-film" (South Korean Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,402, issued on June 10, was assigned to Korean Research Institute of Standard and Science (Daejeon, South Korea).

"Vibration insensitive interferometry for measuring thickness and profile of multilayer thin-film" was invented by Yong-sik Ghim (Sejong-Si, South Korea), Yong-bum Seo (Gwangju, South Korea) and Hyug-gyo Rhee (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to an apparatus and a method for a thickness and a profile of a multilayer thin film using a vibration insensitive interference method are provided, which allow measuring the phase of a measurement object by acquiring a plurality of d...