US Patent Issued to KLA on Jan. 20 for "In-situ in-band out-of-band spectral measurement for EUV tools" (American, Chinese, German Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,954, issued on Jan. 20, was assigned to KLA Corp. (Milpitas, Calif.).

"In-situ in-band out-of-band spectral measurement for EUV tools" was invented by Rajeev Rajendran (San Francisco), Michael Xie (Shanghai), Farid Atry (San Jose, Calif.), Florian Melsheimer (Cologne, Germany) and Rui-Fang Shi (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate is mounted on a chuck in a chamber of an EUV tool. An illumination aperture in the chamber provides a beam of light to illuminate the substrate on the chuck. The beam of light includes extreme ultraviolet (EUV) in-band (IB) light and out-of-band (OOB) light. The OOB light has longer ...