US Patent Issued to KLA on Dec. 2 for "Amplitude asymmetry measurements in overlay metrology" (American, Israeli Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,533, issued on Dec. 2, was assigned to KLA Corp. (Milpitas, Calif.).

"Amplitude asymmetry measurements in overlay metrology" was invented by Vladimir Levinski (Migdal HaEmek, Israel) and Andrew V. Hill (Sunriver, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system may include a controller to receive two or more images of the overlay target from one or more detectors of an optical sub-system, the overlay target including first and second periodic features generated with different measurement conditions, each measurement condition associated with at least one of a sample focal distance or a configuration of diffraction orders of the ...