US Patent Issued to JEOL on June 17 for "Focused ion beam system and method of correcting deviation of field of view of ion beam" (Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,300, issued on June 17, was assigned to JEOL Ltd. (Tokyo).

"Focused ion beam system and method of correcting deviation of field of view of ion beam" was invented by Yuichiro Ohori (Tokyo) and Keiji Tajima (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An FIB system includes an ion source for producing the ion beam, a lens system which includes an objective lens and which is operative to focus the ion beam onto a sample such that secondary electrons are produced from the sample, a detector for detecting the secondary electrons, and a controller for controlling the lens system. The controller operates i) to provide control so that a focus of th...