US Patent Issued to International Business Machines on Sept. 30 for "Wraparound contact with reduced distance to channel" (New York Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,432,960, issued on Sept. 30, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Wraparound contact with reduced distance to channel" was invented by Ruilong Xie (Niskayuna, N.Y.), Reinaldo Vega (Mahopac, N.Y.), Yao Yao (Albany, N.Y.), Andrew M. Greene (Slingerlands, N.Y.), Veeraraghavan S. Basker (Schenectady, N.Y.), Pietro Montanini (Albany, N.Y.), Jingyun Zhang (Albany, N.Y.) and Robert Robison (Rexford, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A nanosheet semiconductor device includes channel nanosheets each connected to a source/drain region that has a front surface, a rear surface, and an internal recess between the ...