ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,979, issued on Sept. 16, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Pass-through wiring in notched interconnect" was invented by Nicholas Anthony Lanzillo (Wynantskill, N.Y.), Albert M. Chu (Nashua, N.H.), Ruilong Xie (Niskayuna, N.Y.), Reinaldo Vega (Mahopac, N.Y.), Lawrence A. Clevenger (Saratoga Springs, N.Y.) and Brent A. Anderson (Jericho, Vt.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of present invention provide a semiconductor structure. The semiconductor structure includes a metal level, the metal level includes a metal strip including a notch at a side of the metal strip or a pass-through inside...