US Patent Issued to International Business Machines on May 20 for "Photoacid generator for chemically amplified photoresists for deep ultra violet and extreme ultraviolet lithography" (Swiss Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,535, issued on May 20, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Photoacid generator for chemically amplified photoresists for deep ultra violet and extreme ultraviolet lithography" was invented by Gerhard Ingmar Meijer (Zurich), Valery Weber (Gattikon, Switzerland) and Peter Willem Jan Staar (Zurich).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photoacid generator (PAG) anion, a photoresist composition, and a method are disclosed. The PAG anion includes a moiety, selected from an alkyl group, a monocyclic aromatic group, and a bicyclic aromatic group, that includes a carbon atom with a negative elementary charge. The...