US Patent Issued to International Business Machines on Aug. 19 for "Method to release nano sheet after nano sheet fin recess" (American, Japanese Inventors)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,396,225, issued on Aug. 19, was assigned to International Business Machines Corp. (Armonk, N.Y.).

"Method to release nano sheet after nano sheet fin recess" was invented by Chanro Park (Clifton Park, N.Y.), Kangguo Cheng (Schenectady, N.Y.), Ruilong Xie (Niskayuna, N.Y.), Juntao Li (Cohoes, N.Y.) and ChoongHyun Lee (Chigasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method including forming a plurality of nanosheet layers on a substrate and forming a plurality of first sacrificial layers on the substrate, wherein the plurality of nanosheet layers and the plurality of first sacrificial layers are arranged in alternating layers, where the p...