ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,937, issued on Aug. 12, was assigned to International Business Machines Corp. (Armonk, N.Y.).
"Sam formulations and cleaning to promote quick depositions" was invented by Rudy J. Wojtecki (San Jose, Calif.), Nicholas Anthony Lanzillo (Wynantskill, N.Y.), Prasad Bhosale (Albany, N.Y.) and Son Nguyen (Schenectady, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the invention provide self-assembled monolayers (SAM) formulations and cleaning to promote quick depositions. A hydrogen-based plasma clean is performed on a structure, the structure including a metal layer and a dielectric layer. A self-assembled monolayers (SAM) solution is...