ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,168, issued on July 15, was assigned to INTERNATIONAL BUSINESS MACHINES Corp. (Armonk, N.Y.) and SCREEN SPE USA LLC (Sunnyvale, Calif.).

"Solvent annealing of an organic planarization layer" was invented by Jing Guo (Niskayuna, N.Y.), Wenyu Xu (Albany, N.Y.), Indira Seshadri (Niskayuna, N.Y.), Luciana Meli-Thompson (Albany, N.Y.), Dustin Wayne Janes (Albany, N.Y.), Jon Fayad (Ballston Lake, N.Y.), Eric Evans (Saratoga, N.Y.) and Domenico DiPaola (Glasco, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a planarization layer is provided that can include depositing an organic planarization layer on a deposition surface using a ...