ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,513,984, issued on Dec. 30, was assigned to Intel Corp. (Santa Clara, Calif.).
"Double-sided integrated circuit transistor structures with depopulated bottom channel regions" was invented by Varun Mishra (Hillsboro, Ore.), Peng Zheng (Portland, Ore.), Aaron Lilak (Beaverton, Ore.), Tahir Ghani (Portland, Ore.), Harold Kennel (Portland, Ore.) and Mauro Kobrinsky (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Integrated circuitry comprising interconnect metallization on both front and back sides of a gate-all-around (GAA) transistor structure lacking at least one active bottom channel region. Bottom channel regions may be depopulated from ...