US Patent Issued to HORIBA FRANCE on June 24 for "Reflective diffraction grating resistant to an ultra-short-pulse light flux with high peak power and method for the production thereof" (French Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,474, issued on June 24, was assigned to HORIBA FRANCE SAS (Palaiseau, France).

"Reflective diffraction grating resistant to an ultra-short-pulse light flux with high peak power and method for the production thereof" was invented by Romain Feilleux (Palaiseau, France) and Amine Boussadi (Palaiseau, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a reflective diffraction grating including at least one intermediate metal layer arranged between the external reflective layer and a surface of the substrate including the grating lines, the external reflective layer being consisted of a first metal and the intermediate metal layer being c...