US Patent Issued to HON HAI PRECISION INDUSTRY on Feb. 18 for "Deposition mask, mask member for deposition mask, method of manufacturing deposition mask, and method of manufacturing organic EL display apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,226,854, issued on Feb. 18, was assigned to HON HAI PRECISION INDUSTRY Co. LTD. (New Taipei, Taiwan).

"Deposition mask, mask member for deposition mask, method of manufacturing deposition mask, and method of manufacturing organic EL display apparatus" was invented by Hideo Takei (Osaka, Japan), Susumu Sakio (Osaka, Japan) and Katsuhiko Kishimoto (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask member for a deposition mask is provided. The deposition mask has a resin film in which a pattern of opening portions is formed. The mask member includes a resin film and a reflective film. The reflective film is on a surface of the resin film. ...