US Patent Issued to Hitachi Industrial Equipment Systems on Feb. 4 for "Monitoring system, monitoring apparatus, and monitoring method" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,216,528, issued on Feb. 4, was assigned to Hitachi Industrial Equipment Systems Co. Ltd. (Tokyo).

"Monitoring system, monitoring apparatus, and monitoring method" was invented by Masashi Kono (Tokyo), Yuusuke Nakagawa (Tokyo), Hidetoshi Honjo (Tokyo) and Kenji Kimura (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A monitoring apparatus includes: an input unit that accepts equipment identifying information for identifying monitoring object equipment and an analysis purpose; and an output unit that, when analysis item data corresponding to the analysis purpose among operation data indicating an operating status of the identified monitoring object eq...