US Patent Issued to Hainan Normal University on Aug. 5 for "Rhodosorus marinus and application thereof in preparing facial masks" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,377,040, issued on Aug. 5, was assigned to Hainan Normal University (Haikou, China).

"Rhodosorus marinus and application thereof in preparing facial masks" was invented by Li Wei (Hainan, China), Han Zhu (Hainan, China), Li Zhang (Hainan, China), Lishan Lan (Hainan, China), Chunyun Lei (Hainan, China) and Hang Su (Hainan, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to Rhodosorus marinus and an application thereof in preparing facial masks. Rhodosorus marinus ZS2001 has the following collection information: collection institution: China Center for Type Culture Collection (CCTCC); address of the collection institutio...