US Patent Issued to FUTAMURA KAGAKU, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY on Dec. 9 for "Per- and polyfluoroalkyl compound-adsorbing activated carbon" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,492,128, issued on Dec. 9, was assigned to FUTAMURA KAGAKU K.K. (Nagoya, Japan) and NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Tokyo).

"Per- and polyfluoroalkyl compound-adsorbing activated carbon" was invented by Nobuyoshi Yamashita (Tsukuba, Japan), Sachi Taniyasu (Tsukuba, Japan), Tsutomu Kousaka (Aichi, Japan), Makoto Yokoi (Minokamo, Japan), Chiharu Hori (Minokamo, Japan), Kodai Shimamura (Minokamo, Japan) and Takuya Asano (Minokamo, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "[SUMMARY][OBJECT] To provide a per- and polyfluoroalkyl compound-adsorbing activated carbon having a high collection rate of per- and polyfluor...