US Patent Issued to FUJIFILM on April 15 for "Photosensitive resin composition, cured film, inductor and antenna" (Japanese Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,032, issued on April 15, was assigned to FUJIFILM Corp. (Tokyo).

"Photosensitive resin composition, cured film, inductor and antenna" was invented by Tatsuo Ishikawa (Haibara-gun, Japan) and Tatsuo Mikami (Odawara, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The main object of the present invention is to provide a photosensitive resin composition with which a cured film that exhibits a high magnetic permeability real part Mu' and a low magnetic loss tan Delta in the high frequency region can be formed."

The patent was filed on Sept. 28, 2021, under Application No. 17/487,269.

*For further information, including images, charts and tables, p...