ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,418, issued on June 10, was assigned to FUJIFILM Corp. (Tokyo) and THE UNIVERSITY OF TOKYO (Tokyo).

"Standard sample film, method for producing standard sample film, standard sample, sample set, quantitative analysis method, and transfer film" was invented by Takuro Sugiyama (Kanagawa, Japan), Yuko Terao (Kanagawa, Japan), Yasuhiko Hirana (Kanagawa, Japan), Tetsuro Otsuka (Kanagawa, Japan), Akinori Sugishima (Kanagawa, Japan), Yasuharu Shiraishi (Kanagawa, Japan), Takafumi Hirata (Tokyo) and Yoshiki Makino (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a standard sample film for use in laser ablation inductively coupled plasma ma...