US Patent Issued to FOUNDATION OF SOONGSIL UNIVERSITY-INDUSTRY COOPERATION on July 8 for "High-speed nanopatterning method and apparatus of two-color super-resolution photolithography" (South Korean Inventor)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,353,138, issued on July 8, was assigned to FOUNDATION OF SOONGSIL UNIVERSITY-INDUSTRY COOPERATION (Seoul, South Korea).

"High-speed nanopatterning method and apparatus of two-color super-resolution photolithography" was invented by Dong-Ryoung Lee (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present subject matter provides a high-speed nanopatterning method and apparatus of two-color super-resolution photolithography. According to the present subject matter, a high-speed nanopatterning apparatus of two-color super-resolution photolithography comprises: a first light source for outputting photochemical reaction initiation light o...