US Patent Issued to FONDAZIONE ISTITUTO ITALIANO DI TECNOLOGIA on Sept. 30 for "Photoresist formulations 3D microprinting techniques" (Italian Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,766, issued on Sept. 30, was assigned to FONDAZIONE ISTITUTO ITALIANO DI TECNOLOGIA (Genoa, Italy).

"Photoresist formulations 3D microprinting techniques" was invented by Marco Carlotti (Pisa, Italy), Omar Tricinci (Pietracamela, Italy) and Virgilio Mattoli (Pisa, Italy).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention fits into the 3D microprinting sector and relates to a process for producing degradable 3D polymeric nano- or microstructures having sub-micrometre resolution. The process of the invention uses a photoresist formulation comprising a mixture of: (i) cyclic ketene acetal monomers; (ii) vinyl and/or (meth)acrylic mono...