ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,434,030, issued on Oct. 7, was assigned to Fisher & Paykel Healthcare Ltd. (Auckland, New Zealand).
"Respiratory mask system" was invented by Mark Arvind McLaren (Auckland, New Zealand), Brett John Huddart (Auckland, New Zealand), Jeroen Hammer (Auckland, New Zealand), Matthew Robert Geoff Slight (Auckland, New Zealand), Vitaly Kapelevich (Auckland, New Zealand) and David Monroy Felix (Auckland, New Zealand).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask assembly includes a mask interface and a headgear assembly. The mask interface includes a housing and a seal that seals around a user's nose and/or mouth in use. The headgear assembly secures the m...