US Patent Issued to ENTEGRIS on March 18 for "Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method" (Japanese Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,252,632, issued on March 18, was assigned to ENTEGRIS INC. (Billerica, Mass.).

"Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method" was invented by Hiroshi Kitamura (Tsu, Japan), Tsuyoshi Masuda (Tsu, Japan), Yoshiyuki Matsumura (Nara, Japan), Akihisa Namiki (Tsu, Japan) and Takeshi Saito (Tsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a chemical-mechanical polishing composition comprising an abrasive, a basic component, at least one compound selected from the group consisting of a quaternary polyammonium salt, a quaternary ammonium salt having 6 or more carbon ...