US Patent Issued to eChem Solutions on Nov. 25 for "Photoresist composition, optical film thereof, and preparing method of the optical film" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,216, issued on Nov. 25, was assigned to eChem Solutions Corp. (Taoyuan, Taiwan).

"Photoresist composition, optical film thereof, and preparing method of the optical film" was invented by Hao Lun Huang (Taoyuan, Taiwan) and Yi Sheng Wu (Taoyuan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a photoresist composition comprising an alkali soluble resin, a photopolymerizable compound, a photoinitiator, a thermal initiator, a black colorant, and a solvent, wherein the photopolymerizable compound contains at least one ethylenically unsaturated monomer and at least one epoxy compound. The present disclosure also prov...