US Patent Issued to DUPONT ELECTRONICS on Sept. 30 for "Photosensitive composition and photoresist dry film made therefrom" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,769, issued on Sept. 30, was assigned to DUPONT ELECTRONICS INC. (Wilmington, Del.).

"Photosensitive composition and photoresist dry film made therefrom" was invented by Tsung-Han Tsai (Hsinchu, Taiwan) and Liyen Lin (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides photosensitive compositions comprising: (a) a novel polymeric binder; (b) a polymerizable compound; (c) a photoinitiator; and (d) a photosensitizer. The photosensitive compositions having improved developing and/or stripping performance with comparable adhesion and resolution."

The patent was filed on Feb. 1, 2022, under Application No. 17/5...