US Patent Issued to DOWA THERMOTECH on Nov. 4 for "Vanadium silicon carbide film, vanadium silicon carbide film coated member, and manufacturing method of vanadium silicon carbide film coated member" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,823, issued on Nov. 4, was assigned to DOWA THERMOTECH Co. LTD. (Tokyo).

"Vanadium silicon carbide film, vanadium silicon carbide film coated member, and manufacturing method of vanadium silicon carbide film coated member" was invented by Satoru Habuka (Aichi, Japan) and Hiroyuki Matsuoka (Akita, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A vanadium silicon carbide film contains vanadium, silicon, and carbon, in which the total of a vanadium element concentration, a silicon element concentration, and a carbon element concentration in the film is 90 at % or more."

The patent was filed on Sept. 29, 2020, under Application No. 17/763,011.

*F...