US Patent Issued to DALIAN UNIVERSITY OF TECHNOLOGY on April 29 for "Chromogenic double inverse opals photonic crystal resin film using water as ink and the preparation thereof" (Chinese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,286,494, issued on April 29, was assigned to DALIAN UNIVERSITY OF TECHNOLOGY (Liaoning, China).

"Chromogenic double inverse opals photonic crystal resin film using water as ink and the preparation thereof" was invented by Shufen Zhang (Liaoning, China), Changtong Zhou (Liaoning, China), Wenbin Niu (Liaoning, China), Wei Ma (Liaoning, China), Bingtao Tang (Liaoning, China) and Suli Wu (Liaoning, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A double-inverse opal photonic crystal resin film is formed by embedding nanospheres in pores of polyacrylate inverse opal framework material and then filling the pores of the double-inverse opal photonic crysta...