ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,082, issued on May 13, was assigned to Dai Nippon Printing Co. Ltd. (Tokyo).

"Vapor chamber, electronic device, metallic sheet for vapor chamber and manufacturing method of vapor chamber" was invented by Shinichiro Takahashi (Tokyo-to, Japan), Kenro Hirata (Tokyo-to, Japan), Takayuki Ota (Tokyo-to, Japan), Taizo Hashimoto (Tokyo-to, Japan) and Kiyotaka Takematsu (Tokyo-to, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A liquid flow path portion of a vapor chamber according to this invention includes a first main flow groove, a second main flow groove and a third main flow groove. A first convex array including a plurality of first convex port...