US Patent Issued to COMPAGNIE GENERAL DES ETABLISSMENTS MICHELIN, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, ECOLE SUPERIEURE DE CHIMIE PHYSIQUE ELECTRONIQUE DE LYON, UNIVERSITE CLAUDE BERNAD LYON 1 on Sept. 30 for "Ethylene-rich diene block polymer having a random block and a polyethylene block" (French Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,515, issued on Sept. 30, was assigned to COMPAGNIE GENERAL DES ETABLISSMENTS MICHELIN (Clermont-Ferrand, France), CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (Paris), ECOLE SUPERIEURE DE CHIMIE PHYSIQUE ELECTRONIQUE DE LYON (Villeurbanne, France) and UNIVERSITE CLAUDE BERNAD LYON 1 (Vitieurbanne, France).

"Ethylene-rich diene block polymer having a random block and a polyethylene block" was invented by Emma Moreso (Clermont-Ferrand, France), Julien Thuilliez (Clermont-Ferrand, France), Francois Jean-Baptiste-Dit-Dominique (Clermont-Ferrand, France), Christophe Boisson (Tramoyes, France), Franck D'Agosto (Genas, France), Nicolas Baulu (Genas, France) and Damien Montarnal (Ruy Mon...