US Patent Issued to City University of Hong Kong on Oct. 14 for "Preparation method of a unidirectional moisturizing nanofiber facial mask substrate with asymmetric wettability" (Chinese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,116, issued on Oct. 14, was assigned to City University of Hong Kong (Kowloon, Hong Kong).

"Preparation method of a unidirectional moisturizing nanofiber facial mask substrate with asymmetric wettability" was invented by Jinlian Hu (Kowloon, Hong Kong), Yifan Si (Kowloon, Hong Kong), Shuo Shi (Kowloon, Hong Kong) and Chunxia Guo (Kowloon, Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention discloses a unidirectional moisturizing nanofiber facial mask substrate with asymmetric wettability and preparation thereof. The preparation includes: preparing a superhydrophilic electrospun fiber membrane on a substrate by electrospinn...