US Patent Issued to CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, ECOLE SUPERIEURE DE PHYSIQUE ET DE CHIMIE INDUSTRIELLES DE LA VILLE DE PARIS, SORBONNE UNIVERSITE on Sept. 23 for "Lithography production method" (French Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,400, issued on Sept. 23, was assigned to CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (Paris), ECOLE SUPERIEURE DE PHYSIQUE ET DE CHIMIE INDUSTRIELLES DE LA VILLE DE PARIS (Paris) and SORBONNE UNIVERSITE (Paris).

"Lithography production method" was invented by Ulrich Bockelmann (Paris) and Kokoura Mensah (Paris).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a device including a deposition of a first resin layer of lithography above or on a protective layer such that the protective layer is included between a conductive layer and the first resin layer; a first lithography of the first resin layer, the protective layer and the ...