US Patent Issued to CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, ECOLE POLYTECHNIQUE, UNIVERSITE D'ORLEANS on Jan. 27 for "Process for producing nanoclusters of silicon and/or germanium exhibiting a permanent magnetic and/or electric dipole moment" (French Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,534,796, issued on Jan. 27, was assigned to CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (Paris), ECOLE POLYTECHNIQUE (Palaiseau, France) and UNIVERSITE D'ORLEANS (Orleans, France).

"Process for producing nanoclusters of silicon and/or germanium exhibiting a permanent magnetic and/or electric dipole moment" was invented by Holger Vach (Coignieres, France), Fatme Jardali (Palaiseau, France), Yvan Bonnassieux (Paris) and Laifa Boufendi (Saint Denis en Val, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process for producing nanoclusters of silicon and/or germanium exhibiting a permanent magnetic and/or electric dipole moment for adjusting the wor...