US Patent Issued to Central Glass on Dec. 23 for "Novolak resin, epoxy resin, photosensitive resin composition, curable resin composition, cured substance, electronic device, production method for novolak resin, and production method for epoxy resin" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,503,587, issued on Dec. 23, was assigned to Central Glass Co. Ltd. (Ube, Japan).

"Novolak resin, epoxy resin, photosensitive resin composition, curable resin composition, cured substance, electronic device, production method for novolak resin, and production method for epoxy resin" was invented by Kensuke Hirotaki (Kawagoe, Japan), Yukari Hara (Kawagoe, Japan), Takashi Aoki (Kawagoe, Japan), Hirokatsu Nagura (Kawagoe, Japan) and Kenji Hosoi (Kawagoe, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A novolak resin including a partial structure represented by -C(CF3)H-. In addition, there are provided a photosensitive resin composition containing the...