US Patent Issued to California Institute of Technology on May 27 for "Plasma enhanced chemical vapor deposition of graphene on optical fibers" (California Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,680, issued on May 27, was assigned to California Institute of Technology (Pasadena, Calif.).

"Plasma enhanced chemical vapor deposition of graphene on optical fibers" was invented by Deepan Kishore Kumar (San Jose, Calif.) and Nai-Chang Yeh (Pasadena, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of growing one or more graphene sheets on one or more regions of an optical fiber using plasma-enhanced chemical vapor deposition (PECVD) includes placing the optical fiber in a growth chamber, placing one or more carbon-containing precursors in the growth chamber, forming a reduced pressure in the growth chamber, and flowing methane gas a...