US Patent Issued to BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY, BEIJING INSTITUTE OF CARBON-BASED INTERGRATED CIRCUIT on May 20 for "Method for manufacturing high-density in-line carbon nanotube thin film" (Chinese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,303,930, issued on May 20, was assigned to BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY Co. LTD (Beijing) and BEIJING INSTITUTE OF CARBON-BASED INTERGRATED CIRCUIT (Beijing).

"Method for manufacturing high-density in-line carbon nanotube thin film" was invented by Jie Han (Beijing) and Hui Wang (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure discloses a method for forming a high-density aligned carbon nanotube film. The method includes injecting a carbon nanotube solution into a container, and adding a dispersant to form a carbon nanotube-dispersant composite. The method also includes adding a substance that interacts w...