US Patent Issued to ASML Netherlands on June 24 for "Apparatus for and method of monitoring droplets in a droplet stream" (California Inventor)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,214, issued on June 24, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Apparatus for and method of monitoring droplets in a droplet stream" was invented by Joshua Mark Lukens (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for monitoring a stream of droplets of target material for generating a radiation beam in a radiation source, wherein the apparatus comprises: a target material emitter for creating the stream of droplets of target material, wherein the target material emitter comprises a chamber configured for the target material to pass through before forming the stream of droplets; a first transducer con...