ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,577, issued on July 29, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Substrate restraining system" was invented by Marinus Augustinus Christiaan Verschuren (Helmond, Netherlands) and Thomas Poiesz (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate restraining system comprising: a substrate table and a plurality of circumferentially arranged restrainers each comprising a spring, wherein the spring has a proximal end and a distal end, wherein the distal end of the spring is radially displaceable, and wherein a base of the proximal end of the spring is fixed to the substrate table at a fixing location...