US Patent Issued to ASM IP Holding on Nov. 18 for "Selective deposition of organic material" (Finnish, South Korean, Belgian, American Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,106, issued on Nov. 18, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Selective deposition of organic material" was invented by Eva Tois (Espoo, Finland), Daniele Chiappe (Espoo, Finland), Marko Tuominen (Helsinki), Viraj Madhiwala (Helsinki), Charles Dezelah (Helsinki), YongGyu Han (Seoul, South Korea), Anirudhan Chandrasekaran (Scottsdale, Ariz.) and Shaoren Deng (Ghent, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to methods and apparatuses for the manufacture of semiconductor devices. More particularly, the disclosure relates to methods and apparatuses for depositing an organic layer selecti...