ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,505, issued on May 13, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Deposition of organic films" was invented by Eva E. Tois (Espoo, Finland), Hidemi Suemori (Helsinki), Viljami J. Pore (Helsinki), Suvi P. Haukka (Helsinki), Varun Sharma (Helsinki), Jan Willem Maes (Wilrijk, Belgium), Delphine Longrie (Ghent, Belgium) and Krzysztof Kachel (Leuven, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "Processes are provided herein for deposition of organic films. Organic films can be deposited, including selective deposition on one surface of a substrate relative to a second surface of the substrate. For example, polymer films may be ...