US Patent Issued to artience, Nanyang Technological University on Jan. 27 for "Block copolymer, resin composition, stretch conductor, electronic device, and pressure-sensitive adhesive film" (Japanese, Singaporean Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,534,563, issued on Jan. 27, was assigned to artience Co. LTD. (Tokyo) and Nanyang Technological University (Singapore).

"Block copolymer, resin composition, stretch conductor, electronic device, and pressure-sensitive adhesive film" was invented by Kazutoshi Oba (Tokyo), Yukie Matsuda (Tokyo), Yuki Mizuno (Tokyo), Atsushi Nakazato (Tokyo) and Atsushi Goto (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "A block copolymer consists mainly of structural units each derived from an ethylenically unsaturated monomer and has at least one mercapto group. The block copolymer has an Mn of 5,000-500,000 and has a block structure, which is an A-B-A tribloc...