US Patent Issued to Applied Materials on May 13 for "Method and apparatus of low temperature plasma enhanced chemical vapor deposition of graphene" (California Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,497, issued on May 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Method and apparatus of low temperature plasma enhanced chemical vapor deposition of graphene" was invented by Thai Cheng Chua (Cupertino, Calif.), Christian Valencia (Alhambra, Calif.), Chikuang Wang (Santa Clara, Calif.), Bencherki Mebarki (Santa Clara, Calif.), Hanh Nguyen (San Jose, Calif.) and Philip Allan Kraus (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include methods and apparatuses used to deposit graphene layers. In an embodiment, a method of depositing a graphene layer on a substrate comprises providing ...