US Patent Issued to Applied Materials, National University of Singapore on Nov. 25 for "Molybdenum(IV) and molybdenum(III) precursors for deposition of molybdenum films" (Singaporean Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,479,872, issued on Nov. 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and National University of Singapore (Singapore).

"Molybdenum(IV) and molybdenum(III) precursors for deposition of molybdenum films" was invented by Andrea Leoncini (Singapore), Paul Mehlmann (Singapore), Nemanja Dordevic (Singapore), Han Vinh Huynh (Singapore) and Doreen Wei Ying Yong (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Molybdenum(IV) and molybdenum(III) coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form...