ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,931, issued on June 10, was assigned to Alliance for Sustainable Energy LLC (Golden, Colo.) and Rochester Institute of Technology (Rochester, N.Y.).

"Nitrogen-enabled high growth rates in hydride vapor phase epitaxy" was invented by Elisabeth Lynne McClure (Lakewood, Colo.), Kevin Louis Schulte (Denver), Aaron Joseph Ptak (Littleton, Colo.), John David Simon (Austin, Texas) and Wondwosen Tilahun Metaferia (Aurora, Colo.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are methods and devices that use a low-thermal conductivity inert gas to shield reactant gases and thus enabling a cold wall operation within a hot wall system."

The pa...