INTERNATIONAL PATENT: ZTE CORPORATION, 中兴通讯股份有限公司 FILES APPLICATION FOR "METHOD FOR ELIMINATING DIRECT-CURRENT LEAKAGE AND DEVICE, MEDIUM AND PRODUCT"

GENEVA, Jan. 26 -- ZTE CORPORATION (ZTE Plaza, Keji Road South, Hi-Tech Industrial Park, Nanshan DistrictShenzhen, Guangdong 518057), 中兴通讯股份有限公司 (中国广东省深圳市南山区高新技术产业园科技南路中兴通讯大厦) filed a patent application (PCT/CN2025/100215) for "METHOD FOR ELIMINATING DIRECT-CURRENT LEAKAGE, AND DEVICE, MEDIUM AND PRODUCT" on Jun 10, 2025. With publication no. WO/2026/016675, the details related to the patent application was published on Jan 22, 2026.

Notably, the patent application was submitted...