GENEVA, Feb. 17 -- ZEON CORPORATION (6-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008246), 日本ゼオン株式会社 (東京都千代田区丸の内一丁目６番２号) filed a patent application (PCT/JP2024/024186) for "ANTIREFLECTION MEMBER AND MANUFACTURING METHOD" on Jul 04, 2024. With publication no. WO/2025/033041, the details related to the patent application was published on Feb 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LA, Hung Trong (c/o ZEON...