INTERNATIONAL PATENT: XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD., 西安奕斯伟材料科技股份有限公司, XI'AN XINSEMI MATERIAL TECHNOLOGY CO., LTD., 西安欣芯材料科技有限公司 FILES APPLICATION FOR "EPITAXIAL SILICON WAFER AND MANUFACTURING METHOD THEREFOR"

Posted On: 2025-11-17

GENEVA, Nov. 17 -- XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD. (Room 1-3-029, No.1888 South Xifeng Rd., Hi-tech ZoneXi'an, Shaanxi 710100), 西安奕斯伟材料科技股份有限公司 (中国陕西省西安市高新区西沣南路1888号1-3-029室), XI'AN XINSEMI MATERIAL TECHNOLOGY CO., LTD. (Room 1-1-046, 1 Block, No.1888 South Xifeng RD, Hi-tech ZoneXi'an, Shaanxi 710114), 西安欣芯材料科技有限公司 (中国陕西省西安市高新区西沣南&...

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INTERNATIONAL PATENT: XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD., 西安奕斯伟材料科技股份有限公司, XI'AN XINSEMI MATERIAL TECHNOLOGY CO., LTD., 西安欣芯材料科技有限公司 FILES APPLICATION FOR "EPITAXIAL SILICON WAFER AND MANUFACTURING METHOD THEREFOR"