INTERNATIONAL PATENT: XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD., 西安奕斯伟材料科技股份有限公司, XI'AN ESWIN SILICON WAFER TECHNOLOGY CO., LTD., 西安奕斯伟硅片技术有限公司 FILES APPLICATION FOR "MONITORING DEVICE AND METHOD FOR EPITAXIAL REACTION CHAMBER"

Posted On: 2025-03-08

GENEVA, March 8 -- XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD. (Room 1-3-029, No.1888 South Xifeng Rd., Hi-tech ZoneXi'an, Shaanxi 710100), 西安奕斯伟材料科技股份有限公司 (中国陕西省西安市高新区西沣南路1888号1-3-029室), XI'AN ESWIN SILICON WAFER TECHNOLOGY CO., LTD. (1888 South Xifeng Rd., Hi-tech ZoneXi'an, Shaanxi 710100), 西安奕斯伟硅片技术有限公司 (中国陕西省西安市高新区西沣南路1888...

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INTERNATIONAL PATENT: XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD., 西安奕斯伟材料科技股份有限公司, XI'AN ESWIN SILICON WAFER TECHNOLOGY CO., LTD., 西安奕斯伟硅片技术有限公司 FILES APPLICATION FOR "MONITORING DEVICE AND METHOD FOR EPITAXIAL REACTION CHAMBER"