INTERNATIONAL PATENT: ULTRON SEMICONDUCTOR (SHANGHAI) CO., LTD., 至微半导体(上海)有限公司, PNC PROCESS SYSTEMS CO., LTD., 上海至纯洁净系统科技股份有限公司 FILES APPLICATION FOR "WAFER CLEANING METHOD BASED ON DROPLET IMPACT"

Posted On: 2025-07-07

GENEVA, July 7 -- ULTRON SEMICONDUCTOR (SHANGHAI) CO., LTD. (Room 03, Floor 3, Building 1, No.170 Zihai Road, Minhang DistrictShanghai 200241), 至微半导体(上海)有限公司 (中国上海市闵行区紫海路170号1幢3层03室), PNC PROCESS SYSTEMS CO., LTD. (No.170 Zihai Road, Minhang DistrictShanghai 200241), 上海至纯洁净系统科技股份有限公司 (中国上海市闵行区紫海路170号) filed a patent application (PCT/CN2024/113035) for "WAFER CLEANING ME...

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INTERNATIONAL PATENT: ULTRON SEMICONDUCTOR (SHANGHAI) CO., LTD., 至微半导体(上海)有限公司, PNC PROCESS SYSTEMS CO., LTD., 上海至纯洁净系统科技股份有限公司 FILES APPLICATION FOR "WAFER CLEANING METHOD BASED ON DROPLET IMPACT"